Dry etch proximity modeling in mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 86-91

  Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

CD control; Etch bias; Etch modeling; Etching; Microloading; OPC; RET

Indexed keywords

CD CONTROL; ETCH APERTURE EFFECTS; ETCH BIAS; MICROLOADING; OPC MODELING; VARIABLE BIAS MODEL;

FABRICATION; LASER BEAMS; MASKS; MATHEMATICAL MODELS; NONLINEAR SYSTEMS; OPTIMIZATION; PROCESS CONTROL; REGRESSION ANALYSIS; WSI CIRCUITS;

DRY ETCHING;

EID: 1642433155     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504052     Document Type: Conference Paper

References (3)

1. A. Buxbaum, M. Buie, B. Stoehr, W. Montgomery, S. Fuller, "Characterization of an integrated multibeam laser mask-pattern generation and dry-etch processing total solution", SPIE 4562, p. 338, 2001.
2. Y.Granik, "Correction for etch proximity: new models and applications", SPIE 4346, p. 98,2001.
3. Y.Granik, N. Cobb, " New Process Models for OPC at sub-90nm Nodes", SPIE, 2003.