Advanced model formulations for optical and process proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 721-729

  Beale, Daniel F ^a   Shiely, James P ^a   Melvin III, Lawrence L ^a   Rieger, Michael L ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Etching; OPC; Process proximity correction; Process window; PSM; Variable threshold

Indexed keywords

AERIAL IMAGES; PROCESS PROXIMITY CORRECTIONS; PROCESS WINDOWS; VARIABLE THRESHOLDS;

ALGORITHMS; COMPUTER SIMULATION; ERROR ANALYSIS; ETCHING; IMAGING TECHNIQUES; MATHEMATICAL MODELS; PASSIVATION; PERTURBATION TECHNIQUES;

PHOTOLITHOGRAPHY;

EID: 3843098115     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544258     Document Type: Conference Paper

References (12)

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