Advances in Ta2O5 film growth with chemical vapor deposition

Gongneng Cailiao/Journal of Functional Materials

Volumn 37, Issue 4, 2006, Pages 511-514

  Yan, Zhi Qiao ^a   Xiong, Xiang ^a   Xiao, Peng ^a   Huang, Bai Yun ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

CVD; Film; Metallorganic compound; Ta2O5; Tantalum halide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; FILM GROWTH; OPTICAL WAVEGUIDES; OXIDES; THIN FILMS;

METALLORGANIC COMPOUND; PRECURSORS; RECENT ADVANCES; TANTALUM HALIDE; TANTALUM PENTOXIDE; TRANSFORMATION MECHANISM;

TANTALUM COMPOUNDS;

EID: 33745768454     PISSN: 10019731     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (31)

1. Cheng W H, Chi S F, Chu A K. [J]. Thin Solid Films, 1999, 347(1-2): 233-237.
2. Zhou Mingfei, Fu Zhengwen, Qin Qizong. [J]. Applied Surface Science, 1998, 125: 208-212.
3. Shimizu K, Kobayashi K, Thompson G E, et al. [J]. J Electrochem Soc, 1997, 144(2): 418-423.
4. Shibata S. [J]. Thin Solid Films, 1996, 227(1-2): 1-4
5. Hudner P E, Helber D, Kushe H. [J]. Solid Films, 1996, 282(2): 415-418.
6. Ozer C, Lampert M. [J]. J Sol-Gel Technol, 1997, 8(1-3): 703
7. Devine B A B, Chaneliere C, Autran J L, et al. [J]. Microelectronic Engineering, 1997, 36: 61-64.
8. Four S, Devine R A B, Luo E Z, et al. [J]. Journal of N-Crystalline Solids, 1999, 254: 139-145.
9. Kukli K, Ritala M, Matero R, et al. [J]. Journal of Crystal Growth, 2000, 212(3-4): 459-468.
10. Tanimoto S, Matsui M, Aoyagi M, et al. [C]. Japan: Extended Abstracts of the 22nd (1990 International) Conference on Solid State Devices and Materials, 1990. 195-198.
11. Graham D W, Stinton D P. [J]. J Am Ceram Soc, 1994, 77(9): 2298-2304.
12. Bae Y W, Lee W Y, Stinton D P. [J]. J Am Ceram Soc, 1995, 78(5): 1297-1300.
13. Forsgren K, Harta A H. [J]. Thin Solid Films, 1999, 343-344: 111-114.
14. Porporati A, Roitti S, Sabizero O. [J]. Journal of the European Ceramic Society, 2003, 23: 247-251.
15. Kwak I C, Lee Y H, Choi Y H. [J]. Applied Surface Science, 2004, 230: 249-253.
16. Lee J S, Chang S J, Chen J F, et al. [J]. Materials Chemistry and Physics, 2002, 77: 242-247.
17. Burte E P, Rausch N. [J]. Journal of Non-Crystalline Solids, 1995, 187: 425-429.
18. Tominaga K, Muhammet R, Kobayshi I, et al. [J]. Jan J Appl Phys, 1992, 31: 585-587.
19. Nagahori A, Raj R. [J]. J Am Ceram Soc, 1995, 78(6): 1585-1592.
20. An C H, Sugimoto K. [J]. J Electrochem Soc, 1992, 139(7): 1956-1962.
21. Autran J L, Paillet P, Leray J L, et al. [J]. Sensors and Actuators, 1995, A5: 5-8.
22. Koyama H, Tanimoto S, Kuroiwa K, et al. [J]. Japanese Journal of Applied Physics, 1994, 33(11): 6291-6298.
23. Aarik J, Kukli K, Aidla A. [J]. Applied Surface Science, 1996, 103: 331-341.
24. Siodmiak M, Frenking G, Korkin A. [J]. Materials Science in Semiconductor Processing, 2000, 3: 65-70.
25. Kukli K, Aarik J, Aidla A, et al. [J]. Applied Surface Science, 1997, 112: 236-242.