Two threshold resist models for optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 3, 2004, Pages 1536-1543

  Huang, W C ^a   Lin, C H ^a   Kuo, C C ^a   Huang, C C ^a   Lin, J F ^a   Chen, J H ^a   Liu, R G ^a   Ku, Y C ^a   Lin, B J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Constant threshold resist model; Optical proximity correction; Two constant threshold resist models; Variable threshold resist model

Indexed keywords

COMPUTATIONAL METHODS; COMPUTER SIMULATION; IMAGE ANALYSIS; INTEGRATED CIRCUITS; LIGHTING; MASKS; PROBLEM SOLVING; SEMICONDUCTOR DEVICE MANUFACTURE;

CONSTANT THRESHOLD RESIST MODELS; OPTICAL PROXIMITY CORRECTION; TWO CONSTANT THRESHOLD RESIST MODELS; VARIABLE THRESHOLD RESIST MODELS;

PHOTORESISTS;

EID: 3843070851     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.544252     Document Type: Conference Paper

References (7)

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