Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5713, Issue , 2005, Pages 247-258

  Chapman, Glenn H ^a   Dykes, James ^a   Poon, David ^a   Choo, Chinheng ^a   Wang, Jun ^a   Peng, Jun ^a   Tu, Yuqiang ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Bimetallic; Direct write; Grayscale; Interference Lithography; Photomask; Thermal Resist; Thin Film

Indexed keywords

DENSITY (OPTICAL); ELECTRON BEAMS; LASER APPLICATIONS; LIGHT ABSORPTION; MASKS; MICROSTRUCTURE; PHOTOLITHOGRAPHY; THIN FILMS; TRANSPARENCY;

BIMETALLIC; DIRECT-WRITE; GRAYSCALE; INTERFERENCE LITHOGRAPHY; PHOTOMASKS; THERMAL RESISTS;

MICROELECTROMECHANICAL DEVICES;

EID: 23744474994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601545     Document Type: Conference Paper

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