Expanding grayscale capability of direct-write grayscale photomask by using modified bi/in compositions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Poon, David K ^a   Chapman, Glenn H ^a   Choo, Chinheng ^a   Wang, Jun ^a   Tu, Yuqiang ^a   La Haye, Michelle L ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Bimetallic thermal resist; Direct write photomask; Expanding grayscale; Grayscale photomask; MEMS

Indexed keywords

BIMETALS; CALIBRATION; DENSITY (OPTICAL); LASER BEAMS; THIN FILMS;

BIMETALLIC THERMAL RESIST; DIRECT-WRITE PHOTOMASK; EXPANDING GRAYSCALE; GRAYSCALE PHOTOMASK;

MASKS;

EID: 33644596522     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632245     Document Type: Conference Paper

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