A prototype laser activated bimetallic thermal resist for microfabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4274, Issue , 2001, Pages 183-193

  Sarunic, Marinko V ^a   Chapman, Glenn H ^a   Tu, Yuqiang ^a  

^a SIMON FRASER UNIVERSITY   (Canada)

Author keywords

Thermal resist microfabrication lithography bimetallic alloy Biln laser

Indexed keywords

BISMUTH; INDIUM; LASER APPLICATIONS; MICROELECTRONICS; MICROFABRICATION; OPTICAL SYSTEMS; PHOTOLITHOGRAPHY; PROFILOMETRY; YTTRIUM ALUMINUM GARNET;

ABSORPTION EDGES; ACTIVATED PROCESS; BIMETALLIC ALLOYS; BIMETALLIC THERMAL RESISTS; EUTECTIC ALLOYS; OPTICAL CHARACTERISTICS; THERMAL RESIST; THICKNESS RATIO;

MICROANALYSIS;

EID: 85076762319     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.432509     Document Type: Conference Paper

References (11)

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