Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 976-987

  Chapman, Glenn ^a   Poon, David ^c   Choo, Chinheng ^c   Tu, Yuqiang ^c   Dykes, James ^c   Wang, Jun ^c   Peng, Jun ^c   Lennard, Willy ^b   Kavanagh, Karen ^c  

^a SIMON FRASER UNIVERSITY   (Canada)

^b UNIVERSITY OF WESTERN ONTARIO   (Canada)

^c NONE

Author keywords

Direct write photomask; Inorganic photoresist; Photomask; Thermal resist

Indexed keywords

BIMETALS; LASER BEAM EFFECTS; MASKS; OPTICAL RESOLVING POWER; OXIDATION; SILICA; TRANSPARENCY;

BIMETALLIC THERMAL RESISTS; DIRECT WRITE PHOTOMASKS; INORGANIC PHOTORESISTS; PHOTOMASKS; THERMAL RESISTS;

HEAT RESISTANCE;

EID: 24644517950     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600463     Document Type: Conference Paper

References (19)

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