Design of orientation stages for step and flash imprint lithography

Precision Engineering

Volumn 25, Issue 3, 2001, Pages 192-199

  Choi, B J ^a   Sreenivasan, S V ^a   Johnson, S ^a   Colburn, M ^a   Wilson, C G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Flexure mechanism; Step and Flash Imprint Lithography; Template stage; Template wafer alignment

Indexed keywords

ERROR ANALYSIS; FRICTION; SUBSTRATES; SURFACE PROPERTIES;

TEMPLATE-WAFER ALIGNMENT;

PHOTOLITHOGRAPHY;

EID: 0035399945     PISSN: 01416359     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0141-6359(01)00068-X     Document Type: Article

References (12)

1. Step and flash imprint lithography: A novel approach to imprint lithography
2. Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography
3. Nanoimprint lithography
4. Template-assisted nanolithography: A process for reliable pattern replication
5. Nanometer scale patterning and pattern transfer on amorphous Si, crystalline Si, and Sio2 surface using self-assembled monomlayers
6. Pattern transfer to silicon by microcontact printing and RIE
7. Soft lithography
8. A metrological three-axis translator and its application for constant force profilometry
9. How to design flexure hinges
10. Foundations of ultraprecision mechanism design