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Volumn 352, Issue 21-22, 2006, Pages 2096-2099
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Conduction mechanism for sputtered a-C:H based structures
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Author keywords
Electrical and electronic properties
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Indexed keywords
CARBON;
CURRENT DENSITY;
ELECTRIC FIELD EFFECTS;
ELECTRIC PROPERTIES;
ELECTRONIC PROPERTIES;
HYDROGENATION;
AMORPHOUS CARBON;
ELECTRIC FIELD INTENSITY;
METAL INSULATOR SEMICONDUCTOR (MIS) STRUCTURES;
SPACE CHARGE LIMITED CURRENT (SCLC);
MIM DEVICES;
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EID: 33745460026
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2006.02.044 Document Type: Article |
Times cited : (5)
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References (29)
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