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Volumn 7, Issue 11-12, 1998, Pages 1734-1738
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Schottky barrier formation on r.f.-plasma enhanced chemical vapour deposited hydrogenated amorphous carbon
a a |
Author keywords
Amorphous carbon; MSM; PECVD; Schottky diode
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Indexed keywords
AMORPHOUS FILMS;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC PROPERTIES;
FILM PREPARATION;
HYDROGENATION;
INTERFACES (MATERIALS);
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCHOTTKY BARRIER DIODES;
POOLE-FRENKEL MECHANISM;
SUBMICRON METAL CONTACTS;
DIAMOND FILMS;
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EID: 0032304635
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/s0925-9635(98)00313-6 Document Type: Article |
Times cited : (17)
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References (18)
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