The effect of substrate bias in amorphous carbon films prepared by magnetron sputtering and monitored by in-situ spectroscopic ellipsometry

Diamond and Related Materials

Volumn 7, Issue 2-5, 1998, Pages 444-448

  Gioti, M ^a   Logothetidis, S ^a  

^a ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

Author keywords

Amorphous carbon; Bias; Ellipsometry; Sputtering

Indexed keywords

CARBON; ELLIPSOMETRY; GROWTH (MATERIALS); MAGNETRON SPUTTERING; THIN FILMS;

BIAS;

AMORPHOUS MATERIALS;

EID: 0031995532     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00297-5     Document Type: Article

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