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Volumn 9, Issue 3, 2000, Pages 1205-1208
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Tailoring of the field emission properties of hydrogenated amorphous carbon thin films by nitrogen incorporation and thermal annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CARBON;
COMPOSITION EFFECTS;
ELECTRIC FIELD EFFECTS;
ELECTRON EMISSION;
ENERGY GAP;
HYDROGENATION;
NITROGEN;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
THERMAL EFFECTS;
THIN FILMS;
CARBON FILMS;
OPTICAL BAND GAP;
AMORPHOUS FILMS;
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EID: 0033737815
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/S0925-9635(99)00303-9 Document Type: Article |
Times cited : (10)
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References (15)
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