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Volumn 9, Issue 3, 2000, Pages 1205-1208

Tailoring of the field emission properties of hydrogenated amorphous carbon thin films by nitrogen incorporation and thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON; COMPOSITION EFFECTS; ELECTRIC FIELD EFFECTS; ELECTRON EMISSION; ENERGY GAP; HYDROGENATION; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; THERMAL EFFECTS; THIN FILMS;

EID: 0033737815     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00303-9     Document Type: Article
Times cited : (10)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.