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Electrochemical and Solid-State Letters

Volumn 9, Issue 8, 2006, Pages

Influence of TaN gate electrode microstructure on its dry etch properties

(5) Shamiryan, D a Paraschiv, V a Tokei Z a Beckx, S a Boullart, W a

a IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ETCHING; MICROSTRUCTURE; TANTALUM COMPOUNDS;

CRYSTALLINE MICROSTRUCTURE; DRY ETCH; METAL GATE ELECTRODES;

ELECTROCHEMICAL ELECTRODES;

EID: 33745410248 PISSN: 10990062 EISSN: None Source Type: Journal
DOI: 10.1149/1.2208010 Document Type: Article

Times cited : (3)

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