Compressed-carbon dioxide (CO2) assisted nanoimprint lithography using polymeric mold

Microelectronic Engineering

Volumn 83, Issue 10, 2006, Pages 1957-1960

  Choi, Won Mook ^a   Song, Min Young ^a   Park, O Ok ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Compressed carbon dioxide; Fluoropolymer; Micro nano patterns; Nanoimprint lithography

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; FABRICATION; FLUORINE CONTAINING POLYMERS; GLASS TRANSITION; INTERFACIAL ENERGY; POLYMETHYL METHACRYLATES; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; COMPRESSIBILITY OF GASES; LITHOGRAPHY; NANOSTRUCTURED MATERIALS;

ANTI-ADHESION LAYER; FLUOROPOLYMER MOLDS; MICRO/NANO-PATTERNS; NANOIMPRINT LITHOGRAPHY; COMPRESSED CARBON DIOXIDE;

NANOTECHNOLOGY; FLUORINE CONTAINING POLYMERS;

EID: 33745164622     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2006.02.003     Document Type: Article

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