Focused ion beams and silicon-on-insulator - a novel approach to MEMS

Smart Materials and Structures

Volumn 9, Issue 3, 2000, Pages 284-290

  Daniel, Jürgen H ^a   Moore, David F ^a   Walker, John F ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b FEI Europe Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELEROMETERS; ETCHING; ION BEAMS; MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MILLING (MACHINING); PHOTORESISTS; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS;

FOCUSED ION BEAM MACHINING; MICROACCELEROMETERS;

INTELLIGENT MATERIALS;

EID: 0033687070     PISSN: 09641726     EISSN: None     Source Type: Journal    
DOI: 10.1088/0964-1726/9/3/306     Document Type: Article

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