High hole and electron mobilities in nanocrystalline silicon thin-film transistors

Journal of Non-Crystalline Solids

Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 1732-1736

  Lee, Czang Ho ^a   Sazonov, Andrei ^a   Nathan, Arokia ^a  

^a UNIVERSITY OF WATERLOO   (Canada)

Author keywords

Microcrystallinity; Plasma deposition; Thin film transistors

Indexed keywords

CMOS INTEGRATED CIRCUITS; NANOSTRUCTURED MATERIALS; PLASMAS; SILICON; THIN FILM TRANSISTORS; THIN FILMS;

MICROCRYSTALLINITY; PLASMA DEPOSITION;

ELECTRON MOBILITY;

EID: 33744510029     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.11.149     Document Type: Article

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