Recent progress of Cat-CVD research in Japan - Bridging between the first and second Cat-CVD conferences

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 7-14

  Matsumura, Hideki ^a   Umemoto, Hironobu ^a   Izumi, Akira ^a   Masuda, Atsushi ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Amorphous silicon; Catalytic chemical vapor deposition (Cat CVD); Polycrystalline silicon; Silicon nitride

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; POLYSILICON; SILICON NITRIDE; THIN FILM TRANSISTORS;

CHAMBER CLEANING;

THIN FILMS;

EID: 0038823901     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00072-5     Document Type: Conference Paper

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