Thin-film transistors on plastic and glass substrates using silicon deposited by microwave plasma ECR-CVD

IEEE Electron Device Letters

Volumn 24, Issue 6, 2003, Pages 399-401

  Teng, Lihong ^a   Anderson, Wayne A ^a  

^a State University of New York   (United States)

Author keywords

Hydrogen dilution; Microwave ECR CVD; Thin film silicon; Thin film transistor

Indexed keywords

CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; GLASS; NANOSTRUCTURED MATERIALS; PLASMAS; SEMICONDUCTING SILICON; THIN FILM TRANSISTORS;

HYDROGEN DILUTION;

MICROWAVE DEVICES;

EID: 0043093719     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2003.813364     Document Type: Article

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