Deposition of hafnium oxide from Hf t -butoxide and nitric oxide

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 3, 2006, Pages 418-423

  Zhang, Z ^a   Xia, B ^a   Gladfelter, W L ^a   Campbell, S A ^a  

^a University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTAMINATION; EFFECTIVE OXIDE THICKNESS (EOT); OXYNITRIDE INTERFACIAL LAYERS;

CARBON; CONTAMINATION; LEAKAGE CURRENTS; NITRIDES; NITROGEN OXIDES; SURFACE CHEMISTRY;

HAFNIUM COMPOUNDS;

EID: 33646575314     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2186660     Document Type: Article

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