Chlorine plasma system instabilities within an ICP tool driven at a frequency of 13.56 MHz

Plasma Sources Science and Technology

Volumn 15, Issue 2, 2006, Pages 193-203

  Soberon F ^a   Marro, F G ^b   Graham, W G ^b   Ellingboe, A R ^a   Law, V J ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC IMPEDANCE; CAPACITORS; CHLORINE; ETCHING; INDUCTIVELY COUPLED PLASMA; MAPPING; PARALLEL PROCESSING SYSTEMS; SEMICONDUCTOR DEVICES;

CHLORINE PLASMA SYSTEMS; CONTINUOUS-WAVE PLASMAS; ELECTRONEGATIVE SPECIES; PARALLEL CAPACITORS;

PLASMA THEORY;

EID: 33646375689     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/2/004     Document Type: Conference Paper

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