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Journal of Physics D: Applied Physics

Volumn 34, Issue 18, 2001, Pages 2726-2733

Rf probe technology for the next generation of technological plasmas

(5) Law, V J a Kenyon, A J a Thornhill, N F a Seeds, A J a Batty, I b

a UNIVERSITY COLLEGE LONDON (United Kingdom)

b Cambridge Analogue Technology Ltd (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; BANDWIDTH; HARMONIC ANALYSIS; MATHEMATICAL MODELS; PLASMA DEVICES; SIGNAL INTERFERENCE; THERMAL NOISE;

PLASMA PHASE DELAY;

PLASMA PROBES;

EID: 0035929082 PISSN: 00223727 EISSN: None Source Type: Journal
DOI: 10.1088/0022-3727/34/18/303 Document Type: Article

Times cited : (15)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.