Methods for modeling microwave plasma system stability

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 20, Issue 2, 2002, Pages 536-543

  Rummel, Paul ^a   Grotjohn, Timothy A ^a  

^a Michigan State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; GRAPHIC METHODS; MATHEMATICAL MODELS; MICROWAVES; PERTURBATION TECHNIQUES; PLASMA DENSITY; SYSTEM STABILITY;

MICROWAVE CAVITY PLASMA REACTORS (MCPR); MICROWAVE PLASMA SYSTEMS;

SEMICONDUCTOR PLASMAS;

EID: 0036494053     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1453454     Document Type: Article

References (13)