Effect of deposition parameters on composition, structures, density and topography of CrN films deposited by r.f. magnetron sputtering

Applied Surface Science

Volumn 201, Issue 1-4, 2002, Pages 208-218

  Xu, Junhua ^a   Umehara, Hiroyuki ^a   Kojima, Isao ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Composition; CrN films; Crystal structures; Density; Deposition rate; Sputtering; Surface roughness

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CHROMIUM COMPOUNDS; COMPOSITION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NITROGEN; SILICON; SINGLE CRYSTALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 0037202635     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00942-X     Document Type: Article

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