Deposition of TiN/A1N bilayers on a rotating substrate by reactive sputtering

Surface and Coatings Technology

Volumn 157, Issue 1, 2002, Pages 26-33

  Auger, M A ^a   Gago, R ^b   Fernandez M ^a   Sanchez O ^a   Albella, J M ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Aluminium nitride; Reactive sputtering; Titanium nitride

Indexed keywords

ADHESION; ALUMINUM COMPOUNDS; AUGER ELECTRON SPECTROSCOPY; CATHODES; COMPOSITION EFFECTS; FILM GROWTH; HARDNESS; INDENTATION; PROTECTIVE COATINGS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

REACTIVE SPUTTERING;

MAGNETRON SPUTTERING;

ALUMINUM NITRIDE; COATING; INDUSTRIAL APPLICATION; SPUTTERING; TITANIUM NITRIDE; TOOL WEAR;

EID: 0036681992     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00143-3     Document Type: Article

References (11)