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Volumn 13, Issue 3, 2006, Pages

Conversion efficiency of extreme ultraviolet radiation in laser-produced plasmas

Author keywords

[No Author keywords available]

Indexed keywords

LASER APPLICATIONS; LASER BEAMS; LASER PRODUCED PLASMAS; MATHEMATICAL MODELS; OPTIMIZATION;

EID: 33645684022     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2187445     Document Type: Article
Times cited : (23)

References (33)
  • 13
    • 19944433304 scopus 로고    scopus 로고
    • edited by B. A.Hammel, D. D.Meyerhofer, J.Meyer-ter-Vehn, and H.Azechi (American Nuclear Society, Inc., La Grange Park, IL, 2004), pp.
    • K. Nishihara, T. Nishikawa, A. Sasaki, in " Proceedings of Inertial Fusion Sciences and Applications 2003, " edited by, B. A. Hammel, D. D. Meyerhofer, J. Meyer-ter-Vehn, and, H. Azechi, (American Nuclear Society, Inc., La Grange Park, IL, 2004), pp. 1069-1073; see, also, "EUV Sources for Lithography," edited by, V. Bakshi, (SPIE, Bellingham, WA, 2006), Chap., pp. 339-371.
    • Proceedings of Inertial Fusion Sciences and Applications 2003 , pp. 1069-1073
    • Nishihara, K.1    Nishikawa, T.2    Sasaki, A.3
  • 14
    • 19944433304 scopus 로고    scopus 로고
    • edited by V.Bakshi (SPIE, Bellingham, WA, 2006), Chap., pp.
    • K. Nishihara, T. Nishikawa, A. Sasaki, in " Proceedings of Inertial Fusion Sciences and Applications 2003, " edited by, B. A. Hammel, D. D. Meyerhofer, J. Meyer-ter-Vehn, and, H. Azechi, (American Nuclear Society, Inc., La Grange Park, IL, 2004), pp. 1069-1073; see, also, "EUV Sources for Lithography," edited by, V. Bakshi, (SPIE, Bellingham, WA, 2006), Chap., pp. 339-371.
    • EUV Sources for Lithography , pp. 339-371


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.