Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography

Inertial Fusion Sciences and Applications 2003

Volumn , Issue , 2004, Pages 1069-1073

  Nishihara, K ^a   Nishikawa, T ^b   Sasaki, A ^c   Kawamura, T ^d   Sunahara, A ^d   Furukawa, H ^d   Murakami, M ^a   Nishimura, H ^a   Shimada, Y ^d   Nakai, M ^a   Fujioka, S ^a   Shigemori, K ^a   Uchida, S ^d   Fujima, K ^e   More, R ^f   Koike, F ^g   Kagawa, T ^h   Zhakhovskii, V ^a   Hashimoto, K ^d   Yamaura, M ^d   Matsui, R ^a   Hibino, T ^a   Okuno, T ^a   Tao, Y ^a   Sohnatzadeh, F L ^a   Nagai, K ^a   Norimatsu, T ^a   Tanuma, H ⁱ   Miyanaga, N ^a   Izawa, Y ^a   more..

^a OSAKA UNIVERSITY   (Japan)

^b OKAYAMA UNIVERSITY   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

^d INSTITUTE FOR LASER TECHNOLOGY   (Japan)

^e UNIVERSITY OF YAMANASHI   (Japan)

^f NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

^g KITASATO UNIVERSITY   (Japan)

^h NARA WOMEN'S UNIVERSITY   (Japan)

ⁱ TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV) RADIATION; PLASMA EXPANSION; RADIATION ENERGY; WAVELENGTH;

BANDWIDTH; ENERGY EFFICIENCY; LIGHT EMISSION; LITHOGRAPHY; MATHEMATICAL MODELS; SPECTRUM ANALYSIS; ULTRAVIOLET RADIATION;

LASER PRODUCED PLASMAS;

EID: 19944433304     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

1. For example "Soft-X-ray Projection Lithography", Vol. 12, OSA Tech. Digest Ser. (Opt. Soc. Am. 1991).
2. G. D. KUBIAK, L. J. BEMARDEZ, K. D. KRENZ and D. J. O'CONNELL, "Debris-free EUVL sources based on gas jets" OSA Proceedings on Extreme-Ultraviolet Lithography, edited by G. D. Kubiak and D. R. Kania (1996), vol.4, p.66.
3. R. C. SPITZER, T. J. ORZECHOWSKI, D. W. PHILLION, R. L. KAUFMANN, and C. CERJAN, "Conversion Efficiencies from Laser-produced Plasmas in the Extreme Ultraviolet Regime", J. Appl. Phys. 79, 2251 (1993).
4. V. BANINE, "Requirements for the Next Generation Lithography EUV Sources", 1st International EUVL Symposium, 14-17, Oct., Dallas, USA, 2002.
5. I. C. E. Turcu (private communication).
6. H. NISHIMURA et al, "Characterization of Extreme UV Radiation in Laser Produced Plasma for Use in Lithography", somewhere in this proceeding.
7. A. RICKERT, K. EIDMANN, and J. MEYER-TERVEHN, "Third International Opacity Workshop and Code Comparison Study Final Report", March 7-11, 1994, MPI for Quantum Optics MPQ204.
8. K. NISHIHARA, "Scaling Laws of Plasma Ablation by Thermal Radiation", Jpn. J. Appl. Phys. 21, L571 (1982).