High-aspect-ratio resist for thick-film applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2438, Issue , 1995, Pages 846-852

  LaBianca, Nancy C ^a   Gelorme, Jeffrey D ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; APPLICATIONS; EPOXY RESINS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PROCESSING; THICK FILMS;

CHEMICAL RESISTANCE; EXPOSURE TIME; HIGH ASPECT RATIO; MICROMACHINED PARTS; NEGATIVE RESISTS; PLATING STENCILS; THERMAL STABILITY; THICK FILM RESISTS; ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0029227196     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)