Micromachining program status at the SRRC

Microsystem Technologies

Volumn 4, Issue 1, 1997, Pages 12-16

  Cheng, Y ^a   Shew, B Y ^a   Shih, W P ^b   Wang, S S ^b   Lin, C Y ^b   Yang, W K ^a   Lu, M ^a,c   Lee, W H ^d  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^d NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002181074     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s005420050083     Document Type: Article

References (11)

1. Cheng Y: (1996) LIGA activity in Taiwn, Microsystem Technologies 2, p. 157-161, Springer-Verlag
2. Huang YC; Shew B-Y; Cheng Y: (1997) Dielectric-based laserdriven particle accelerators fabricated by deep x-ray Lithography. FEL conference, Beijin
3. Winick H: (1980) Properties of synchrotron radiation. Winick, H.; Donach, S.; "ed" Synchrotron Radiation research, New York, Plenum Press, ch. 2, p. 11-p.25
4. Cheng Y; Kuo N-Y; Su CH: (1997) Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers. Review of Scientific Instruments, Vol. 68, No. 5, p. 2163-p. 2166
5. Shih W-P; Shew BY; Cheng Y; Hwang G-J: (1997) Dosage modeling for deep x-ray lithography application. Harmst 97, Microsystem Technologies, printing
6. Michette AG: (1986) Optical systems for soft x-rays, New York, Plenum Press.
7. Shew BY; Cheng Y; Shih W-P; Lu M; Lee WH: (1997) High precision, low cost mask for deep x-ray lithography. Harmst 97, Microsystem Technologies, printing
8. Chou BCS; Chen C-N; Shie J-S: (1996) A method of fabricating a thin, and low stress dielectric film for microsensors applications. Eurosensors X, Leuven, Belgium, P1.1-173
9. Shih W-P; Lin CY; Cheng Y; Hwang G-J: (1997) Low cost X-ray conformal mask using dry-film resist. Submitted to Microelectronics Eng
10. Mohr J: (1989) Resist technology for deep-etch synchrotron radiation lithography. Markro. Chem., Macromol. Symp. 24, 231-251
11. Henke BL; Gullikson EM; Davis JC: (1993) X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50-30,000 eV, Z = 1-92. Atomic Data and Nuclear Tables, Vol. 54, no. 2, p. 181-342