SU-8 based deep x-ray lithography/LIGA

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 394-401

  Jian, Linke ^a,b   Desta, Yohannes M ^a   Goettert, Jost ^a   Bednarzik, Martin ^b   Loechel, Bernd ^b   Yoonyoung, Jin ^a   Aigeldinger, Georg ^a   Singh, Varshni ^a   Ahrens, Gisela ^c   Gruetzner, Gabi ^c   Ruhmann, Ralf ^c   Degen, Reinhard ^d  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b HAHN MEITNER INSTITUT   (Germany)

^c MICRO RESIST TECHNOLOGY GMBH   (Germany)

^d Micromotion GmbH   (Germany)

Author keywords

3D lithography; LIGA; MEMS; SU 8; X ray lithography

Indexed keywords

CRYSTAL MICROSTRUCTURE; EPOXY RESINS; MICROELECTROMECHANICAL DEVICES; POLYMETHYL METHACRYLATES; X RAY LITHOGRAPHY;

DEEP X RAY LITHOGRAPHY; PATTERN QUALITY; THREE DIMENSIONAL LITHOGRAPHY;

MICROMACHINING;

EID: 0038694405     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478246     Document Type: Conference Paper

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