Oxygen quenching effect in ultra-deep x-ray lithography with SU-8 resist

Journal of Micromechanics and Microengineering

Volumn 14, Issue 3, 2004, Pages 410-414

  Shew, Bor Yuan ^a   Huang, Tai Yuan ^a   Liu, Kun Pei ^b   Chou, Chang Pin ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

FREE-RADICAL SCAVENGERS; LOW-DOSED RESISTS;

CHEMICAL BONDS; FLUORESCENCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRRADIATION; LITHOGRAPHY; MICROMACHINING; OXYGEN; POLYMETHYL METHACRYLATES; SENSITIVITY ANALYSIS; SYNCHROTRONS;

QUENCHING;

EID: 1642619079     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/14/3/014     Document Type: Article

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