Fabrication of ferroelectric Pb(Zr,Ti)O3 thin films by liquid delivery metalorganic chemical vapor deposition using a novel titanium source Ti(OEt)2(DPM)2

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 A, 2006, Pages 1752-1756

  Otani, Yohei ^a   Okamura, Soichiro ^b   Shtosaki, Tadashi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

111 orientation; Liquid delivery; Low temperature deposition; MOCVD; Post annealing; PZT; Thin film; Ti(OEt)2(DPM)2

Indexed keywords

ANNEALING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PEROVSKITE; THIN FILMS;

LIQUID DELIVERY; LOW-TEMPERATURE DEPOSITION; TI(OET)2(DPM)2;

LEAD COMPOUNDS;

EID: 33644985995     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.1752     Document Type: Article

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