Pb-based and Bi-based ferroelectric thin films

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Shiosaki, Tadashi ^a   Shimizu, Masaru ^b  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032391858     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. R. C. Ibrahim, T. Sakai, T. Nishida, T. Horiuchi, T. Shiosaki and K. Matsushige, Jpn. J. Appl. Phys. 35, 4995 (1996).
2. R. C. Ibrahim, T. Sakai, T. Nishida, T. Horiuchi, T. Shiosaki and K. Matsushige, Proc. Tenth IEEE Int. Symp. Applications of Ferroelectrics (IEEE Service Center, Piscataway, NJ, U.S.A., 1996), pp. 157-160.
3. T. Okamura, M. Adachi, T. Shiosaki and A. Kawabata, Jpn. J. Appl. Phys. 30, 1034 (1991).
4. T. Hase and T. Shiosaki, Jpn. J. Appl. Phys. 30, 2159 (1991).
5. M. Shimizu, K. Hayashi, T. Katayama and T. Shiosaki, Proc. Eighth IEEE Int. Symp. Application of Ferroelectrics (IEEE Service Center, Piscataway, NJ, U.S.A., 1992), pp. 428-431.