Synthesis of Ti(DPM)2(OCH3)2 and evaluation of the TiO2 films prepared by metal-organic chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 SUPPL. B, 1997, Pages 5820-5824

  Ando, Fumio ^a   Shimizu, Hisashi ^a   Kobayashi, Ichizo ^b   Okada, Masaru ^a  

^a CHUBU UNIVERSITY   (Japan)

^b TAIYO NIPPON SANSO CORPORATION   (Japan)

Author keywords

MOCVD; Source materials; Step coverage; Ti(DPM)2(OCH3)2; TiO2 film

Indexed keywords

ASPECT RATIO; CYANIDES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METHANOL; SILICON; SUBSTRATES; SYNTHESIS (CHEMICAL); TITANIUM DIOXIDE; VAPOR PRESSURE;

LEAD ZIRCONATE TITANATE;

FERROELECTRIC MATERIALS;

EID: 0031221133     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5820     Document Type: Article

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