Reactive dual magnetron sputtering of oxides for large area production of optical multilayers

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 1997, Pages 179-183

  Strumpfel, J ^a   Beister, G ^a   Schulze, D ^a   Kammer, M ^a   Rehn, St ^a  

^a Von Ardenne Anlagentechnik GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; CATHODES; LIGHT MEASUREMENT; MAGNETRON SPUTTERING; OPTICAL FILMS; PROCESS CONTROL; SEMICONDUCTING INDIUM COMPOUNDS; SILICA; SPUTTER DEPOSITION; TIN COMPOUNDS; TITANIUM CARBIDE;

DUAL MAGNETRON CATHODES; INDIUM TIN OXIDE; PLASMA EMISSION MONITOR (PEM) CONTROL CIRCUITS; TIN DIOXIDE;

OPTICAL MULTILAYERS;

EID: 0031348883     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)