Effect of the nature of the working gas on the d.c. magnetron sputter deposition of chromium nitride and oxi-nitride thin films on steel substrates

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 190-194

  Baborowski, J ^a   Charbonnier, M ^a   Romand, M ^a  

^a UNIVERSITÉ LYON 1   (France)

Author keywords

Chromium nitride films; Chromium oxi nitride films; Magnetron reactive sputtering deposition; X ray emission analysis

Indexed keywords

ARGON; COMPOSITION; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; SPUTTER DEPOSITION; STEEL; STOICHIOMETRY; X RAY ANALYSIS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROMETERS;

CHROMIUM NITRIDE FILMS; CHROMIUM OXI-NITRIDE FILMS; LOW ENERGY ELECTRON INDUCED XRAY SPECTROMETRY; MAGNETRON REACTIVE SPUTTERING DEPOSITION; STEEL SUBSTRATES; WORKING GAS; XRAY EMISSION ANALYSIS; XRAY FLUORESCENCE SPECTROMETRY;

THIN FILMS;

EID: 0030110257     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02709-2     Document Type: Article

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