Differentiation of molecules in a mixed self-assembled monolayer of H-and Cl-terminated bicyclo[2.2.2]octane derivatives

Nanotechnology

Volumn 17, Issue 7, 2006, Pages

  Fujii, Shintaro ^a   Fujihira, Masamichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; IONS; MOLECULAR ORIENTATION; MONOLAYERS; NANOSTRUCTURED MATERIALS; SELF ASSEMBLY; VACUUM;

ELECTRONEGATIVITIES; NANOCLUSTER; OCTANE DERIVATIVES;

ULTRATHIN FILMS;

EID: 33644980663     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/17/7/S03     Document Type: Article

References (39)

1. Morita S, Wiesendanger R and Meyer E 2002 Noncontact Atomic Force Microscopy (Berlin: Springer)
2. Gotsmann B, Schmidt C, Seidel C and Fuchs H 1998 Eur. Phys. J. B 4 267
3. Tanaka S, Suzuki H, Kamikado T and Mashiko S 2003 Thin Solid Films 438-439 56
4. Yoda T, Ichii T, Fukuma T, Kobayashi K, Yamada H and Matsushige K 2004 Japan. J. Appl. Phys. 43 4691
5. Nony L, Bennewitz R, Pfeiffer O, Gnecco E, Baratoff A, Meyer E, Eguchi T, Gourdon A and Joachim C 2004 Nanotechnology 15 S91
6. Uchihashi T, Ishida T, Komiyama M, Ashino M, Sugawara Y, Mizutani W, Yokoyama K, Morita S, Tokumoto H and Ishikawa M 2000 Appl. Surf. Sci. 157 244
7. Kobayashi K, Yamada H, Horiuchi T and Matsushige K 2000 Appl. Surf. Sci. 157 228
8. Mativetsky J M, Burke S A, Hoffmann R, Sun Y and Grutter P 2004 Nanotechnology 15 S40
9. Fukui K, Onishi H and Iwasawa Y 1997 Chem. Phys. Lett. 280 296
10. Fukuma T, Kobayashi K, Horiuchi T, Yamada H and Matsushige K 2001 Appl. Phys. A 72 S109
11. Sasahara A, Uetsuka H and Ohishi H 2001 Surf. Sci. 481 L437
12. Sasahara A, Uetsuka H and Ohishi H 2001 J. Phys. Chem. B 105 1
13. Sasahara A, Uetsuka H and Ohishi H 2001 Phys. Rev. B 64 121406
14. Perez R, Stich I, Payne M C and Terakura K 1998 Phys. Rev. B 58 10835
15. Foster A S, Shluger A L and Nieminen R M 2002 Appl. Surf. Sci. 188 306
16. Fujii S, Akiba U and Fujihira M 2004 Nanotechnology 15 S19
17. Fujii S and Fujihira M 2006 Japan. J. Appl. Phys. (special issue: 13th Int. Conf. on Scanning Tunnelling Microscopy/Spectroscopy and Related Techniques (STM'05)) at press
18. Giessibl F J 1995 Science 267 68
19. Kitamura S and Iwatsuki M 1995 Japan. J. Appl. Phys. 34 L145
20. Sugawara Y, Ohta M, Ueyama H and Morita S 1995 Science 270 1646
21. Foster A S, Gal A Y, Nieminen R M and Shluger A L 2005 J. Phys. Chem. B 109 4554
22. Bat-Uul B, Fujii S, Shiokawa T, Ohzono T and Fujihira M 2004 Nanotechnology 15 710
23. Foster A S, Barth C, Shluger A L and Reichling M 2001 Phys. Rev. Lett. 86 2373
24. Barth C, Foster A S, Reichling M and Shluger A L 2001 J. Phys.: Condens. Matter 13 2061
25. Foster A S, Barth C, Shluger A L, Nieminen R M and Reichling M 2002 Phys. Rev. B 66 235417
26. Bammerlin M, Lüthi R, Meyer E, Baratoff A, Lü J, Guggisberg M, Gerber C, Howald L and Güntherodt H-J 1997 Probe Microsc. 1 3
27. Bammerlin M, Lüthi R, Meyer E, Baratoff A, Lü J, Guggisberg M, Loppacher C, Gerber C and Güntherodt H-J 1998 Appl. Phys. A 66 S293
28. Reichling M and Barth C 1999 Phys. Rev. Lett. 83 768
29. Bennewitz R, Foster A S, Kantorovich L N, Bammerlin M, Loppacher C, Schär S, Guggisberg M, Meyer E and Shluger A L 2000 Phys. Rev. B 62 2074
30. Hoffmann R, Lantz M A, Hug H J, van Schendel P J A, Kappenberger P, Martin S, Baratoff A and Güntherodt H-J 2002 Appl. Surf. Sci. 188 238
31. Klust A, Ohta T, Bostwick A A, Yu Q, Ohuchi F S and Olmstead M A 2004 Phys. Rev. B 69 035405
32. Giessibl F J and Reichling M 2005 Nanotechnology 16 S118
33. Livshits A I and Shluger A L 1999 Appl. Surf. Sci. 141 274
34. Fujii S, Akiba U and Fujihira M 2001 Chem. Commun. 1688
35. Tasker P W 1979 J. Phys. C: Solid State Phys. 12 4977
36. Dubois L H and Nuzzo R G 1992 Annu. Rev. Phys. Chem. 43 437
37. Zehner R W, Parsons B F, Hsung R P and Sita L R 1999 Langmuir 15 1121
38. Ganzorig C, Kwak K J, Yagi K and Fujihira M 2001 Appl. Phys. Lett. 79 272
39. De Renzi V, Rousseau R, Marchetto D, Biagi R, Scandolo S and del Pennino U 2005 Phys. Rev. Lett. 95 046804