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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 3 A, 2006, Pages 1582-1587

Formation and characterization of NiSi-silicided n+p shallow junctions

(2) Wang, Chao Chun a Chen, Mao Chieh a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

Author keywords

Agglomeration; N+p shallow junction; NiSi; silicide; Thermal stability

Indexed keywords

ACTIVATION ENERGY; AGGLOMERATION; ANNEALING; CURRENT DENSITY; NICKEL COMPOUNDS; THERMODYNAMIC STABILITY; THIN FILMS;

MINORITY GENERATION CURRENT; N+P SHALLOW JUNCTIONS; NISI; SILICIDES;

SEMICONDUCTOR JUNCTIONS;

EID: 33644930905 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.1582 Document Type: Article

Times cited : (3)

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