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1
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0029406506
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Q. F. Wang, A. Lauwers, B. Deweerdt, R. Verbeeck, F. Loosen, and K. Maex, IEEE Trans. Semiconduct Manufact., vol. 8, p. 449, 1995.
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IEEE Trans. Semiconduct Manufact.
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Wang, Q.F.1
Lauwers, A.2
Deweerdt, B.3
Verbeeck, R.4
Loosen, F.5
Maex, K.6
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2
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21544464729
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M. L. A. Dass, D. B. Fraser, and C.-S. Wei, Appl. Phys. Lett., vol. 58, p. 1308, 1991.
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Appl. Phys. Lett.
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Dass, M.L.A.1
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0030291120
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P. Apte, A. Paranjpe, and G. Pollack, IEEE Electron Device Lett., vol. 17, p. 506, 1996.
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IEEE Electron Device Lett.
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Apte, P.1
Paranjpe, A.2
Pollack, G.3
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5
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0029483743
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Kyoto, Japan
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Q. F. Wang, K. Maex, S. Kubicek, R. Jonckheere, B. Kerkwijk, R. Verbeeck, S. Biesemans, and K. De Meyer, in Proc. Symp. VLSI Technology, Kyoto, Japan, 1995, p. 17.
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Proc. Symp. VLSI Technology
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Wang, Q.F.1
Maex, K.2
Kubicek, S.3
Jonckheere, R.4
Kerkwijk, B.5
Verbeeck, R.6
Biesemans, S.7
De Meyer, K.8
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6
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33749693705
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U.S. Patent 5 780 362, continuation application pending
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Q. F. Wang and K. Maex, U.S. Patent 5 780 362, continuation application pending.
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Wang, Q.F.1
Maex, K.2
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7
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33646221233
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San Francisco, CA, June
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A. Lauwers, P. Besser, M. de Potter, E. Kondoh, N. Roelandts, A. Steegen, M. Stucchi, and K. Maex, in Proc. IEEE Int. Interconnect Technology Conf. (IITC), San Francisco, CA, June 1998, p. 99.
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(1998)
Proc. IEEE Int. Interconnect Technology Conf. (IITC)
, pp. 99
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Lauwers, A.1
Besser, P.2
De Potter, M.3
Kondoh, E.4
Roelandts, N.5
Steegen, A.6
Stucchi, M.7
Maex, K.8
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9
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33749738549
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Honolulu, HI
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A. Steegen, I. De Wolf, and K. Maex, in Proc. Symp. VLSI Technology, Honolulu, HI, 1998, p. 200.
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(1998)
Proc. Symp. VLSI Technology
, pp. 200
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Steegen, A.1
De Wolf, I.2
Maex, K.3
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10
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33749746435
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P. Besser, A. Lauwers, N. Roelandts, K. Maex, W. Blum, R. Alvis, M. Stucchi, and M. de Potter, Proc. Mat. Res. Soc., 1998, vol. 514.
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(1998)
Proc. Mat. Res. Soc.
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Besser, P.1
Lauwers, A.2
Roelandts, N.3
Maex, K.4
Blum, W.5
Alvis, R.6
Stucchi, M.7
De Potter, M.8
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11
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33749748480
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K. Maex, E. Kondoh, A. Lauwers, A. Steegen, M. de Potter, P. Besser, and J. Proost, Mat. Res. Soc. Proc., vol. 514, 1998.
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(1998)
Mat. Res. Soc. Proc.
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Maex, K.1
Kondoh, E.2
Lauwers, A.3
Steegen, A.4
De Potter, M.5
Besser, P.6
Proost, J.7
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12
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33749697622
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to be published
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E. Kondoh, T. Conard, S. Jin, W. Vandervorst, H. Bender, M. de Potter, and K. Maex, J. Mater. Res., to be published.
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J. Mater. Res.
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Kondoh, E.1
Conard, T.2
Jin, S.3
Vandervorst, W.4
Bender, H.5
De Potter, M.6
Maex, K.7
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13
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0005319999
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to be published
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C. De Tavernier, R. Van Meirhaeghe, F. Cardon, R. Donaton, and K. Maex, Appl. Phys. Lett., to be published.
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Appl. Phys. Lett.
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De Tavernier, C.1
Van Meirhaeghe, R.2
Cardon, F.3
Donaton, R.4
Maex, K.5
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14
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33749718960
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E. Kondoh, G. Vereecke, M. M. Heyns, K. Maex, T. Gutt, and Z. Nenyei, Mat. Res. Soc. Proc., vol. 525, 1998.
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(1998)
Mat. Res. Soc. Proc.
, vol.525
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Kondoh, E.1
Vereecke, G.2
Heyns, M.M.3
Maex, K.4
Gutt, T.5
Nenyei, Z.6
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