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Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 197-200

Microstructure-dependent band structure of HfO2 thin films

(3) Zheng, Y B a Wang, S J a Huan, C H A a

a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING (Singapore)

Author keywords

Annealing effects; Band structure; Dielectric thin films

Indexed keywords

BAND STRUCTURE; HAFNIUM COMPOUNDS; MICROSTRUCTURE; RAPID THERMAL ANNEALING; SPECTROPHOTOMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

ANNEALING EFFECTS; CONDUCTION BAND; DIELECTRIC THIN FILMS;

THIN FILMS;

EID: 33644889617 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.09.124 Document Type: Conference Paper

Times cited : (21)

References (21)

1
- 79956054375
- S. Sayan, E. Garfunkel, and S. Suzer Appl. Phys. Lett. 80 2002 2135
- (2002) Appl. Phys. Lett. , vol.80 , pp. 2135
- Sayan, S.¹ Garfunkel, E.² Suzer, S.³

2
- 0034739021
- A.I. Kingon, J.P. Maria, and S.K. Streiffer Nature (Lond.) 406 2000 1032
- (2000) Nature (Lond.) , vol.406 , pp. 1032
- Kingon, A.I.¹ Maria, J.P.² Streiffer, S.K.³

3
- 0035872897
- G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
- (2001) J. Appl. Phys. , vol.89 , pp. 5243
- Wilk, G.D.¹ Wallace, R.M.² Anthony, J.M.³

4
- 0003711399
- Gate dielectrics and MOS ULSIs
- Springer-Verlag Berlin
- T. Hori Gate Dielectrics and MOS ULSIs, Springer Series in Electronics and Photonics 1997 Springer-Verlag Berlin
- (1997) Springer Series in Electronics and Photonics
- Hori, T.¹

5
- 0034187380
- J. Robertson J. Vac. Sci. Technol., B 18 2000 1785
- (2000) J. Vac. Sci. Technol., B , vol.18 , pp. 1785
- Robertson, J.¹

6
- 1242285015
- C.C. Fulton, G. Lucovsky, and R.J. Nemanich Appl. Phys. Lett. 84 2004 580
- (2004) Appl. Phys. Lett. , vol.84 , pp. 580
- Fulton, C.C.¹ Lucovsky, G.² Nemanich, R.J.³

7
- 0942299982
- G. Shang, P.W. Peacock, and J. Robertson Appl. Phys. Lett. 84 2004 106
- (2004) Appl. Phys. Lett. , vol.84 , pp. 106
- Shang, G.¹ Peacock, P.W.² Robertson, J.³

8
- 3142676819
- A. van der Lee, J. Durand, D. Blin, Ph. Hollige, and F. Martin Eur. Phys. J. B 39 2004 273
- (2004) Eur. Phys. J. B , vol.39 , pp. 273
- Van Der Lee, A.¹ Durand, J.² Blin, D.³ Hollige, Ph.⁴ Martin, F.⁵

9
- 0037321524
- M.Y. Ho, H. Gong, G.D. Wilk, B.W. Busch, M.L. Green, P.M. Voyles, D.A. Muller, M. Bude, W.H. Lin, A. See, M.E. Loomans, S.K. Lahiri, and Petri I. Räisänen J. Appl. Phys. 93 2003 1477
- (2003) J. Appl. Phys. , vol.93 , pp. 1477
- Ho, M.Y.¹ Gong, H.² Wilk, G.D.³ Busch, B.W.⁴ Green, M.L.⁵ Voyles, P.M.⁶ Muller, D.A.⁷ Bude, M.⁸ Lin, W.H.⁹ See, A.¹⁰ Loomans, M.E.¹¹ Lahiri, S.K.¹² Räisänen Petri, I.¹³

10
- 0345376777
- G.D. Wilk, and D.A. Muller Appl. Phys. Lett. 83 2003 3984
- (2003) Appl. Phys. Lett. , vol.83 , pp. 3984
- Wilk, G.D.¹ Muller, D.A.²

11
- 1942540819
- H. Kim, A. Marshall, P.C. Mclntyre, and K.C. Saraswat Appl. Phys. Lett. 84 2004 2064
- (2004) Appl. Phys. Lett. , vol.84 , pp. 2064
- Kim, H.¹ Marshall, A.² McLntyre, P.C.³ Saraswat, K.C.⁴

12
- 0035848090
- S.J. Wang, C.K. Ong, S.Y. Xu, P. Chen, W.C. Tjiu, J.W. Chai, A.C.H. Huan, W.J. Yoo, J.S. Lim, W. Feng, and W.K. Choi Appl. Phys. Lett. 78 2001 1604
- (2001) Appl. Phys. Lett. , vol.78 , pp. 1604
- Wang, S.J.¹ Ong, C.K.² Xu, S.Y.³ Chen, P.⁴ Tjiu, W.C.⁵ Chai, J.W.⁶ Huan, A.C.H.⁷ Yoo, W.J.⁸ Lim, J.S.⁹ Feng, W.¹⁰ Choi, W.K.¹¹

13
- 0037474987
- S.J. Wang, P.C. Lim, A.C.H. Huan, C.L. Liu, J.W. Chai, S.Y. Chow, J.S. Pan, Q. Li, and C.K. Ong Appl. Phys. Lett. 82 2003 2047
- (2003) Appl. Phys. Lett. , vol.82 , pp. 2047
- Wang, S.J.¹ Lim, P.C.² Huan, A.C.H.³ Liu, C.L.⁴ Chai, J.W.⁵ Chow, S.Y.⁶ Pan, J.S.⁷ Li, Q.⁸ Ong, C.K.⁹

14
- 0034889496
- M. Dawber, J.F. Scott, and A.J. Hartmann J. Eur. Ceram. Soc. 21 2001 1633
- (2001) J. Eur. Ceram. Soc. , vol.21 , pp. 1633
- Dawber, M.¹ Scott, J.F.² Hartmann, A.J.³

15
- 79955987885
- H.Y. Hu, M.F. Li, B.J. Cho, C.C. Yeo, M.S. Joo, D.L. Kwong, J.S. Pan, C.H. Ang, J.Z. Zheng, and S. Ramanathan Appl. Phys. Lett. 81 2002 376
- (2002) Appl. Phys. Lett. , vol.81 , pp. 376
- Hu, H.Y.¹ Li, M.F.² Cho, B.J.³ Yeo, C.C.⁴ Joo, M.S.⁵ Kwong, D.L.⁶ Pan, J.S.⁷ Ang, C.H.⁸ Zheng, J.Z.⁹ Ramanathan, S.¹⁰

16
- 17944364804
- Y.B. Zheng, S.J. Wang, A.C.H. Huan, C.Y. Tan, L. Yan, and C.K. Ong Appl. Phys. Lett. 86 2005 112910
- (2005) Appl. Phys. Lett. , vol.86 , pp. 112910
- Zheng, Y.B.¹ Wang, S.J.² Huan, A.C.H.³ Tan, C.Y.⁴ Yan, L.⁵ Ong, C.K.⁶

17
- 0037100765
- H. Kato, T. Nango, T. Miyagawa, T. Katagiri, K.S. Seol, and Y. Ohki J. Appl. Phys. 92 2002 1106
- (2002) J. Appl. Phys. , vol.92 , pp. 1106
- Kato, H.¹ Nango, T.² Miyagawa, T.³ Katagiri, T.⁴ Seol, K.S.⁵ Ohki, Y.⁶

18
- 79956027162
- Y.J. Cho, N.V. Nguyen, C.A. Richter, J.R. Ehrstein, B.H. Lee, and J.C. Lee Appl. Phys. Lett. 80 2002 1249
- (2002) Appl. Phys. Lett. , vol.80 , pp. 1249
- Cho, Y.J.¹ Nguyen, N.V.² Richter, C.A.³ Ehrstein, J.R.⁴ Lee, B.H.⁵ Lee, J.C.⁶

19
- 4043069747
- H.S. Baik, M. Kim, G.S. Park, S.A. Song, M. Varela, A. Franceschetti, S.T. Pantelides, and S.J. Pennycook Appl. Phys. Lett. 85 2004 672
- (2004) Appl. Phys. Lett. , vol.85 , pp. 672
- Baik, H.S.¹ Kim, M.² Park, G.S.³ Song, S.A.⁴ Varela, M.⁵ Franceschetti, A.⁶ Pantelides, S.T.⁷ Pennycook, S.J.⁸

20
- 0035903398
- G. Lucovsky, G.B. Rayner Jr., D. Kang, G. Appel, R.S. Johnson, Y. Zhang, D.E. Sayers, H. Ade, and J.L. Whitten Appl. Phys. Lett. 79 2001 1775
- (2001) Appl. Phys. Lett. , vol.79 , pp. 1775
- Lucovsky, G.¹ Rayner Jr., G.B.² Kang, D.³ Appel, G.⁴ Johnson, R.S.⁵ Zhang, Y.⁶ Sayers, D.E.⁷ Ade, H.⁸ Whitten, J.L.⁹

21
- 0003859329
- Benjamin New York
- H.B. Gray Electrons and Chemical Bonding 1962 Benjamin New York
- (1962) Electrons and Chemical Bonding
- Gray, H.B.¹

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