High-thermal-stability (HfO2)1-x(Al2O 3)x film fabricated by dual-beam laser ablation

Thin Solid Films

Volumn 504, Issue 1-2, 2006, Pages 45-49

  Li, Q ^a   Wang, S J ^b   Ng, T H ^a   Chim, W K ^a   Huan, A C H ^b,c   Ong, C K ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

High k dielectric thin films; Interface; Metal insulator semiconductor structures; Pulse laser deposition

Indexed keywords

CAPACITORS; ELECTRIC PROPERTIES; SILICON; THERMODYNAMIC STABILITY; THIN FILMS;

HIGH-K DIELECTRIC THIN FILMS; INTERFACES; METAL-INSULATOR-SEMICONDUCTOR STRUCTURES; PULSE LASER DEPOSITION;

LASER ABLATION;

EID: 33644889342     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.037     Document Type: Conference Paper

References (18)

1. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
2. M. Houssa High-k Dielectrics 2004 Institute of Physics London
3. International Technology Roadmap for Semiconductors 2002 Semiconductor Industry Association San Jose, CA http://public.itrs.net
4. S. Stemmer J. Vac. Sci. Technol., B 22 2004 791
5. S.J. Wang, P.C. Lim, A.C.H. Huan, C.L. Liu, J.W. Chai, S.Y. Chow, J.S. Pan, Q. Li, and C.K. Ong Appl. Phys. Lett. 82 2003 2047
6. P.S. Lysaght, B. Foran, G. Bersuker, P.J. Chen, R.W. Murto, and H.R. Huff Appl. Phys. Lett. 82 2003 1266
7. J.C. Lee, S.J. Oh, M. Cho, C.S. Hwang, and R. Jung Appl. Phys. Lett. 84 2004 1305
8. L. Manchanda, M.L. Green, R.B. Van Dover, M.D. Morris, A. Kerber, Y. Hu, J.P. Han, P.J. Silverman, T.W. Sorsch, G. Weber, V. Donnelly, K. Pelhos, F. Klemens, N.A. Ciampa, A. Kornblit, Y.O. Kim, J.E. Bower, D. Barr, E. Ferry, D. Jacobson, J. Eng, B. Busch, and H. Schulte Tech. Dig., Int. Electron Devices Meet. 23 2003
9. H.S. Chang, H. Hwang, M.H. Cho, D.W. Moon, S.J. Doh, J.H. Lee, and N.I. Lee Appl. Phys. Lett. 84 2004 28
10. H.Y. Yu, M.F. Li, B.J. Cho, C.C. Yeo, M.S. Joo, D.L. Kwong, J.S. Pan, C.H. Ang, J.Z. Zheng, and S. Ramanathan Appl. Phys. Lett. 81 2002 376
11. P.F. Lee, J.Y. Dai, K.H. Wong, H.L.W. Chan, and C.L. Choy Appl. Phys. Lett. 82 2003 2419
12. H.J. Johnson-Steigelman, A.V. Brinck, S.S. Parihar, and P.F. Lyman Phys. Rev., B 69 2004 235322
13. M.H. Cho, H.S. Chang, Y.J. Cho, D.W. Moon, K.H. Min, R. Sinclair, S.K. Kang, D.H. Ko, J.H. Lee, J.H. Gu, and N.I. Lee Surf. Sci. 554 2004 75
14. J.Y. Dai, K. Li, P.F. Lee, X. Zhao, and S. Redkar Thin Solid Films 462 2004 114
15. M. Copel, and M.C. Reuter Appl. Phys. Lett. 83 2003 3398
16. S.J. Wang, and C.K. Ong Appl. Phys. Lett. 80 2002 2541
17. M.H. Cho, H.S. Chang, Y.J. Cho, D.W. Moon, K.H. Min, R. Sinclair, S.K. Kang, D.H. Ko, J.H. Lee, J.H. Gu, and N.I. Lee Appl. Phys. Lett. 84 2004 571
18. M.Y. Ho, H. Gong, G.D. Wilk, B.W. Busch, M.L. Green, W.H. Lin, A. See, S.K. Lahiri, M.E. Loomans, Petri. I. Raisanen, and T. Gustafsson Appl. Phys. Lett. 81 2002 4218