Electrochemical characterization of adsorption-desorption of the cuprous-suppressor-chloride complex during electrodeposition of copper

Journal of the Electrochemical Society

Volumn 153, Issue 4, 2006, Pages

  Long, John G ^a,c   Searson, Peter C ^a,c   Vereecken, Philippe M ^b,c  

^a Johns Hopkins University   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL POTENTIAL; CUPROUS-SUPPRESSOR-CHLORIDE COMPLEX; SUPPRESSOR; VOIDS;

ADSORPTION; COMPLEXATION; COMPOSITION; CONCENTRATION (PROCESS); DESORPTION; ELECTRODEPOSITION; METALLIZING; PH EFFECTS; SOLUBILITY;

COPPER;

EID: 33644813562     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2168050     Document Type: Article

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