Deposition of thin film silicon using the pulsed PECVD and HWCVD techniques

Solar Energy Materials and Solar Cells

Volumn 76, Issue 3, 2003, Pages 281-291

  Morrison, S ^a   Das, Ujjwal ^a   Madan, Arun ^a  

^a MVSystems Inc   (United States)

Author keywords

a Si:H; HWCVD; PECVD; Si; Solar cell

Indexed keywords

AMORPHOUS SILICON; DEPOSITION; GRAIN SIZE AND SHAPE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SOLAR CELLS;

EID: 0037474789     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00280-5     Document Type: Article

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