Electrochemistry and etching of wide bandgap chemically resistant semiconductors

Proceedings - Electrochemical Society

Volumn PV 2005-04, Issue , 2005, Pages 138-146

  Kelly, J J ^a   Macht, L ^b   Van Dorp, D H ^a   Kooijman, M R ^a   Weyher, J L ^b,c  

^a UTRECHT UNIVERSITY   (Netherlands)

^b RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^c INSTITUTE OF HIGH PRESSURE PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; ETCHING; MORPHOLOGY; SILICON CARBIDE;

ALKALINE SOLUTION; BANDGAP;

SEMICONDUCTOR MATERIALS;

EID: 31844433724     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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