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Volumn 61, Issue 62, 2002, Pages 971-980
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Electrical properties of light-addressed sub-μm electrodes fabricated by use of nanostencil-technology
a b,e c b,e d a
e
EPFL
(Switzerland)
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Author keywords
Light addressing; Nanostencil; Shadow mask; Sub m electrode chip
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Indexed keywords
AMORPHOUS SILICON;
ELECTRIC IMPEDANCE;
ELECTRIC PROPERTIES;
GLASS;
INDIUM COMPOUNDS;
LASER BEAMS;
LIGHT SCATTERING;
PHOTOCONDUCTING MATERIALS;
SUBSTRATES;
GLASS SUBSTRATES;
NANOSTENCIL TECHNOLOGY;
PLANAR MICROELECTRODE ARRAYS (MEA);
MICROELECTRODES;
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EID: 0036643573
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/S0167-9317(02)00422-7 Document Type: Article |
Times cited : (15)
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References (14)
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