Infrared study of Si-rich silicon oxide films deposited by plasma-enhanced chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 15, Issue 2, 1997, Pages 377-389

  Sassella, A ^a   Borghesi, A ^b   Corni, F ^b   Monelli, A ^b   Ottaviani, G ^b   Tonini, R ^b   Pivac, B ^c   Bacchetta, M ^d   Zanotti, L ^d  

^a Istituto Nazionale per la Fisica della Materia Milan   (Italy)

^b INFM   (Italy)

^c RUDER BO KOVI INSTITUTE   (Croatia)

^d STMICROELECTRONICS   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031535906     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580495     Document Type: Article

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