High temperature processing of TiO2 thin films for application in silicon solar cells

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 2, 2004, Pages 339-348

  Richards, Bryce S ^a   Richards, S Raymond ^b   Boreland, Matthew B ^c,e   Jamieson, David N ^d  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

^b Loughborough University ^*  (New Zealand)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

^d UNIVERSITY OF MELBOURNE   (Australia)

^e TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CRYSTAL LATTICES; ELECTRIC RESISTANCE; HIGH TEMPERATURE APPLICATIONS; OXIDATION; PASSIVATION; SILICA; SILICON WAFERS; SOLAR CELLS; SPUTTER DEPOSITION; THIN FILMS;

BACK SURFACE FIELD (BSF); BURIED CONTACT (BC) SOLAR CELLS;

TITANIUM DIOXIDE;

EID: 1842504028     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1647594     Document Type: Article

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