Postexposure bake characterization and parameter extraction for positive deep-UV resists through broad-area exposure experiments

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 110-118

  Zuniga, Marco A ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DIFFUSION; ESTIMATION; ULTRAVIOLET RADIATION;

DEEP-ULTRAVIOLET RESISTS; POST-EXPOSURE BAKE;

PHOTORESISTS;

EID: 0029728391     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241810     Document Type: Conference Paper

References (0)