Vacuum arc ion sources: Recent developments and applications

IEEE Transactions on Plasma Science

Volumn 33, Issue 6 I, 2005, Pages 1931-1943

  Brown, Ian ^a   Oks, Efim ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

Author keywords

Cathode spot; Ion implantation; Ion source; Metal ion beam; Vacuum arc

Indexed keywords

CATHODES; COMPUTER SIMULATION; ION BEAMS; ION IMPLANTATION; MATHEMATICAL MODELS; PLASMA APPLICATIONS; SURFACE TREATMENT; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

CATHODE SPOT; HIGH CURRENT BEAMS; METAL ION BEAM; PLASMA DISCHARGES; PLASMA PHYSICS; VACUUM ARC;

ION SOURCES;

EID: 30444438941     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.860088     Document Type: Review

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