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IEEE Transactions on Plasma Science

Volumn 30, Issue 1 II, 2002, Pages 202-207

Generation of multiply-charged metal ions in vacuum arc plasmas

(1) Oks, Efim M a,b

a INSTITUTE OF HIGH CURRENT ELECTRONICS (Russian Federation)

b TOMSK STATE UNIVERSITY OF CONTROL SYSTEMS AND RADIOELECTRONICS (Russian Federation)

Author keywords

High charge state enhancement; Multiple ionization; Vacuum arc ion sources

Indexed keywords

ELECTRIC CHARGE; ELECTRIC DISCHARGES; ELECTRODES; ELECTRON BEAMS; ION BEAMS; ION SOURCES; IONIZATION; IONS; MAGNETIC FIELDS;

VACUUM ARC ION SOURCES;

PLASMAS;

EID: 0036478210 PISSN: 00933813 EISSN: None Source Type: Journal
DOI: 10.1109/TPS.2002.1003861 Document Type: Conference Paper

Times cited : (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.